Tätigkeitsprofil:

The position:
Research Associate in the field of ALD and PECVD: You will operate and maintain process tools within the cluster, identifying and resolving any process-related issues that arise. You will contribute to the development and
refinement of new processes for Atomic Layer Deposition (ALD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD). Part of your role will involve characterizing thin films using techniques such as ellipsometry, four-point
probe measurements, and atomic force microscopy (AFM). You will analyze experimental data and clearly report your findings to both internal stakeholders and external collaboration partners. Additionally, you will apply statistical
process control (SPC) methods to monitor and ensure consistent tool performance within the cluster.

Anforderungsprofil:

Your qualifications:
You hold a Master's degree in Chemistry, Physics, Electrical Engineering, or micro and nano technology with a background in semiconductor technology. Experience working in a cleanroom environment and knowledge of
semiconductor device fabrication are advantageous. Your specialized expertise should ideally include operating thinfilm deposition tools (such as ALD and/or PECVD) and characterization techniques. Knowledge of process
development and process optimization to meet device-specific requirements is a plus. You are highly organized and capable of working collaboratively within a multinational team. Thanks to your skillful communication, you are a
binding and reliable contact person for our partners. It is necessary that you confidently handle the English language. Knowledge of the German language is welcome.

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